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Voices: Signal-integrity experts speak out

Two experts discuss signal-integrity challenges and their expectations for signal integrity. External Source

Use alternative approaches to evaluate dc/dc synchronous buck converters

Linear systems, online tools, and full simulations help you analyze your designs. External Source

Where did all that racket come from?

To optimize a complementary-input-single-supply amplifier's THD+N (total-harmonic-distortion-plus-noise) performance, place the amplifier in an inverting-gain configuration and keep the closed-loop gain low. External Source

Free ac/dc digital-power reference design has universal input and PFC

Microchip Technology has announced an ac/dc reference design that it based on the new dsPIC33F GS series of digital-power DSCs (digital-signal controllers). External Source

Online tools home in on analog design

Analog design gets easier and more convenient, thanks to free web applications and downloadable tools. External Source

Low-power audio codec incorporates Class D loudspeaker amplifier

National Semiconductor recently announced the low-power LM49352 audio codec (compressor/decompressor) for handheld consumer electronics. External Source

IC monitors input power

International Rectifier has introduced the IR3725 input-power-monitoring IC. The device communicates with a host system over the I2C (inter-integrated-circuit) bus to monitor input power, voltage, and current for power supplies operating on 8 to 23.5V ... External Source

EDN names winners of 19th Annual Innovation Awards

EDN has bestowed its 19th Annual Innovation Awards, honoring a diverse group of electronics engineers and the ground-breaking products they have produced. The Altera Stratix IV 40-nm FPGA design team is named Innovator of the Year. Read on for a complete ... External Source

Cadence executive cogitates future of IC design

We need whole new kinds of flows to deal with the realities of IC design today, Nimish Modi suggests. External Source

EUV prints critical layers for 22-nm SRAM

IMEC (Interuniversity Microelectronics Center) reports having used ASML’s EUV (extreme-ultraviolet) Alpha lithography tool to print the contact and metal patterns for a 22-nm-node SRAM cell—apparently, the first application of the tool for multiple layers ... External Source

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